Intellectual property protection II 0600-S2-O-OWI

1. Intellectual property law: copyright and industrial property law
2. Copyright: the concept and types of works, personal and property copyrights, fair use of works, copyright protection
3. Industrial property law: types of industrial property rights and prerequisites for their protection
4. Patent law: the concept of invention and its types, patent
5. Patent law: patent infringement and non-infringement (privileges), patent protection

Total student workload

Participation in the lecture: 5 h Time devoted to individual work of the student/participant/participant of the course: 5 h Time required to prepare for participation in the assessment process (e.g. exams):15 h Total: 25 hours

Learning outcomes - knowledge

Student knows the basic concepts of intellectual property, in particular patent law and responsibility for their infringement

Learning outcomes - skills

Student can recognize the basic issues of intellectual property law, in particular patent law in academic activity and future work.

Learning outcomes - social competencies

Student knows the aspects of intellectual property law related to the production of chemical substances; Student is aware of the appreciation of intellectual honesty and the observance of professional ethics, both in their own and other people's activities.

Teaching methods

An informative lecture (conventional) and a problem solution lecture with the use of a multimedia presentation.

Expository teaching methods

- participatory lecture
- problem-based lecture
- informative (conventional) lecture

Type of course

compulsory course

Prerequisites

None

Course coordinators

Katarzyna Krupa-Lipińska

Assessment criteria

Written test: 10 single answer questions

Grading: 1 question = 1 point
0-5 points - 2 (ndst)
6 points - 3 (dst)
7 points - 3+ (dst plus)
8 points - 4 (good)
9 points - 4+ (good plus)
10 points - 5 (very good)

Practical placement

not applicable

Bibliography

Basic literature:
K. Czub, Prawo własności intelektualnej, WoltersKuwer, Warszawa 2021

Supplementary literature:
J. Barta, R. Markiewicz, Prawo autorskie i prawa pokrewne, WoltersKluwer, Warszawa 2021
P. Kostański, Ł. Żelechowski, Prawo własności przemysłowej, CH Beck, Warszawa 2020

Additional information

Additional information (registration calendar, class conductors, localization and schedules of classes), might be available in the USOSweb system:

Description of 0600-S2-O-OWI in USOSweb