Synthetic and natural photoprotectans and photosensitive 0600-S2-ChK-SNSPF

Lecture:
During the lecture students will learn about the influence of UV radiation on the skin - the mechanism of tanning, transformation of cellular and non-cellular skin components. The student will know about synthetic and natural sunscreen agents used in cosmetic. The relationship between the structure of the sunscreens and its interaction with the light. The tanning accelerators, photosensitizers and brightening compounds will be discussed. Methods of evaluating the efficacy of sunscreen products will be presented.

Lab:
Testing of the properties of commercial and self-prepared sunscreen creams. Examination of photochemical stability of UV filters, also in the presence of catalyst. Testing of the photoprotective properties of different materials and creams with filters.

Total student workload

Contact hours with teacher 65: - participation in lectures - 15 hrs - laboratory and experimental work – 30 hrs - consultations - 20 hrs Self-study hours: - preparation for lectures - 20 hrs - preparation for test/ examination - 40 hrs Altogether: 125 hrs (5 ECTS)

Learning outcomes - knowledge

W1: student knows synthetic and natural sunscreen compounds and their properties - K_W02, K_W12 W2: student knows symbols and concepts used to describe the effectiveness of filters - K_W02, K_W12 W3: student knows the effect of UV radiation on human skin and knows ways to protect against this radiation - K_W02, K_W12, K_W13

Learning outcomes - skills

U1: the student is able to connect the structure of compounds with their properties - K_U01 U2: the student is able to examine the radiation-protective properties of cosmetic preparations - K_U01, K_U09 U3: student is able to prepare natural compounds with sun protection properties - K_U01, K_U03, K_U09 U4: the student is able to use appropriate analytical methods to examine the properties of radioprotective substances - K_U01, K_U05, K_U09

Learning outcomes - social competencies

K1: the student is able to work independently and organize work - K_K01 K2: the student can see a problem and solve it correctly - K_K03, K_K06 K3: the student works systematically and consistently - K_K05 K4: the student is able to work in a team K_K02

Teaching methods

Lecture: Conventional lecture with multimedia presentations. Laboratory: Experimental work under tutor.

Expository teaching methods

- informative (conventional) lecture

Exploratory teaching methods

- laboratory

Prerequisites

Basic knowledge about general, organic chemistry, physics, physics and biochemistry.

Course coordinators

Term 2025/26Z:

Jolanta Kowalonek
Joanna Skopińska-Wiśniewska

Term 2022/23Z:

Joanna Skopińska-Wiśniewska

Term 2023/24Z:

Jolanta Kowalonek
Joanna Skopińska-Wiśniewska

Term 2024/25Z:

Jolanta Kowalonek
Joanna Skopińska-Wiśniewska

Assessment criteria

Assessment methods:
Lecture - written examination
Laboratory – practical work and test
Assessment criteria:
fail- 50%, satisfactory- 50-60%, satisfactory plus - 61-65 %, good - 66-75 %, good plus - 76-80 %, very good – 81-10 0%.

Bibliography

1. Chemia kosmetyczna wybrane zagadnienia, pod red. A. Sionkowskiej, Wyd. UMK, Toruń 2019
2. M.-C. Martini, Kosmetologia farmakologia skóry, Wydawnictwo Lekarskie PZWL, Warszawa 2007
3. Z. Sarbak, B. Jachymska-Sarbak, A. Sarbak, Chemia w kosmetyce i kosmetologii, MedPharm Polska, Wrocław , 2013
4. Praca zbiorowa, red. J. Pączkowski, Fotochemia polimerów. Teoria i zastosowanie, Wydawnictwo UMK, Toruń 2003 (Fotodegradacja polimerów naturalnych)
5. E.C. Naylor, R.E.B. Watson, M.J. Sherratt, Molecular aspects of skin ageing, Maturitas, 2011, 69, 249-256
6. Załącznik nr 6 do Rozporządzenia Parlamentu Europejskiego i Rady (WE) nr 1223/2009, Wykaz substancji promieniochronnych dozwolonych w produktach kosmetycznych.
7. S.Q. Wang, Y. Balagula, U. Osterwalder, Photoprotection: a review of the current and future technologies, Dermatology and Therapy, 2010, 23, 31-47.

Additional information

Additional information (registration calendar, class conductors, localization and schedules of classes), might be available in the USOSweb system:

Description of 0600-S2-ChK-SNSPF in USOSweb